富勒烯C60的电子束分散动力学
Kinetics of Electron-Beam Dispersion of Fullerite C60
摘要：
电子束分散的压力富勒烯C60目标在真空中导致的薄膜的沉积含有聚合形式的C60。本报告的目的是通过分析靶表面的辐射温度、涂层生长速率和衬底上的负电流密度的动力学来分析富勒烯靶在其电子束分散过程中的物理化学过程。结果表明，该过程的诱导阶段是由负电荷和辐射诱导的修改和加热的目标。过渡阶段的特征在于靶材料通过改性表面层中的孔的非稳态升华和累积的负电荷的释放。由于升华产物对靶的对流冷却和孔下方微腔内部压力的降低，工艺参数的稳定导致靶升华的准静止阶段和含有C60聚合形式的涂层的沉积。
英文摘要：
Electron-beam dispersion of pressed fullerite C60 targets in vacuum leads to the deposition of thin films containing polymeric forms of C60. The aim of the present report is to analyze physical-chemical processes in the fullerite target during its electron-beam dispersion through the analysis of the kinetics of the radiation temperature of the target surface, the coating growth rate and the density of negative current on the substrate. It was shown that the induction stage of the process is determined by the negative charging and radiation-induced modification and heating of the target. The transitional stage is characterized by nonstationary sublimation of the target material through the pores in the modified surface layer and release of the accumulated negative charge. Stabilization of the process parameters owing to the convection cooling of the target by the sublimation products and the decrease in the pressure inside the microcavities beneath the pores leads to a quasi-stationary stage of target sublimation and deposition of a coating containing polymeric forms of C60.
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