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arXiv 1204.4063cond-mat.mtrl-sci
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控制拓扑绝缘体的体电导率:反位缺陷的关键作用

Controlling bulk conductivity in topological insulators: Key role of anti-site defects

D. O. Scanlon, P. D. C. King, R. P. Singh, A. de la Torre, S. McKeown Walker, G. Balakrishnan, F. Baumberger, C. R. A. Catlow

摘要:

二元Bi-chalchogenides,Bi 2 CH 3,被广泛认为是最近发现的新形式量子物质,三维拓扑绝缘体(TI)[1-4]的模型例子。这些化合物具有单一的自旋螺旋表面态,由于时间反演对称性,该表面态保证是金属的,并且应该是实现TI的自旋电子和量子计算应用的理想材料[5]。然而,迄今为止合成的绝大多数此类化合物根本不是绝缘体,而是具有有害的金属体电导率[2,3]。这通常被认为是由于缺陷的无意掺杂造成的,尽管对不同化合物的缺陷性质以及使其有害作用最小化的策略知之甚少。在这里,我们提出了一个全面调查的缺陷景观的双硫族TI的第一性原理计算。我们发现,本征缺陷形成的能量在Te和Se的含TI的根本差异,使整个三元Bi-Te-Se合金系统的导电性的精确控制。从一个系统的角度分辨光电发射(ARPES)的调查,这样的三元合金,结合体传输测量,我们证明,这种方法可以用来实现真正的拓扑绝缘体,只有一个单一的狄拉克锥表面状态相交的化学势。我们的微观计算揭示了实现这一目标的反位缺陷的关键作用,并预测最佳的生长条件,以实现最大电阻三元TI。

英文摘要:

The binary Bi-chalchogenides, Bi2Ch3, are widely regarded as model examples of a recently discovered new form of quantum matter, the three-dimensional topological insulator (TI) [1-4]. These compounds host a single spin-helical surface state which is guaranteed to be metallic due to time reversal symmetry, and should be ideal materials with which to realize spintronic and quantum computing applications of TIs [5]. However, the vast majority of such compounds synthesized to date are not insulators at all, but rather have detrimental metallic bulk conductivity [2, 3]. This is generally accepted to result from unintentional doping by defects, although the nature of the defects responsible across different compounds, as well as strategies to minimize their detrimental role, are surprisingly poorly understood. Here, we present a comprehensive survey of the defect landscape of Bi-chalchogenide TIs from first-principles calculations. We find that fundamental differences in the energetics of native defect formation in Te- and Se-containing TIs enables precise control of the conductivity across the ternary Bi-Te-Se alloy system. From a systematic angle-resolved photoemission (ARPES) investigation of such ternary alloys, combined with bulk transport measurements, we demonstrate that this method can be utilized to achieve true topological insulators, with only a single Dirac cone surface state intersecting the chemical potential. Our microscopic calculations reveal the key role of anti-site defects for achieving this, and predict optimal growth conditions to realize maximally-resistive ternary TIs.

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