arXivDaily arXiv每日学术速递 周一至周五更新
arXiv周末暂无论文更新,休息一下吧,周末愉快~~
arXiv 1202.3464cond-mat.mtrl-scicond-mat.mes-hall
收藏

用低能电子激发从多层石墨烯中去除单层

The Removal of Single Layers from Multi-Layer Graphene by Low Energy Electron Stimulation

Jason D. Jones, Rakesh K. Shah, Guido F. Verbeck, Jose M. Perez

摘要:

报道了使用He等离子体从多层石墨烯中去除单原子层的方法。通过在He等离子体暴露期间施加-60和+60 V的样品偏压,发现层去除是由于等离子体中的电子而不是He离子或中性物。层去除的速率取决于曝光时间、样品偏压和预退火处理。光学对比显微镜和原子力显微镜的研究表明,C原子的去除发生在整个多层样品的时间约一层,没有可观察到的生产大凹坑或减少横向尺寸。层去除建议产生的电子刺激的解离的C原子从基面。该工艺不同于使用反应性物质来蚀刻多层石墨烯的等离子体技术。

英文摘要:

The removal of single atomic layers from multi-layer graphene using a He plasma is reported. By applying sample biases of -60 and +60 V during He plasma exposure, layer removal is found to be due to electrons instead of He ions or neutrals in the plasma. The rate of layer removal depends on exposure time, sample bias and pre-annealing treatments. Optical contrast microscopy and atomic force microscopy studies show that the removal of C atoms occurs approximately one layer at a time across the entire multi-layer sample with no observable production of large pits or reduction in lateral dimensions. Layer removal is proposed to arise from the electron-stimulated dissociation of C atoms from the basal plane. This process differs from plasma techniques that use reactive species to etch multi-layer graphene.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑