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arXiv 1112.0107physics.ins-detastro-ph.IMhep-ex
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SiPM的电气特性与试验频率和温度的关系

Electrical Characterization of SiPM as a Function of Test Frequency and Temperature

M. J. Boschini, C. Consolandi, P. G. Fallica, M. Gervasi, D. Grandi, M. Mazzillo, S. Pensotti, P. G. Rancoita, D. Sanfilippo, M. Tacconi, G. Valvo

摘要:

硅光电倍增器(SiPM)代表了经典光电倍增器的有希望的替代物,例如,用于高能物理和医学物理中的光子检测。在目前的工作中,电气特性的测试设备-由ST微电子制造-提出。面积为3.5x3.5 μ m^2、单元间距为54 μ m的SiPM被制成64 x64单元阵列,填充系数为31%。在频率从20 Hz到1 MHz,温度从300 K到85 K的范围内,测量了SiPM的电容作为反向偏置电压的函数。在400 K到85 K的温度范围内测量了漏电流。因此,阈值电压-即,对应于漏电流的倍增状态开始时的电压可以作为温度的函数来确定。最后,一个电气模型适合再现电容的频率依赖性的依赖。

英文摘要:

Silicon Photomultipliers (SiPM) represent a promising alternative to classical photomultipliers, for instance, for the detection of photons in high energy physics and medical physics. In the present work, electrical characterizations of test devices - manufactured by ST Microelectronics - are presented. SiPMs with an area of 3.5x3.5 micron^2 and a cell pitch of 54 micron were manufactured as arrays of 64x64 cells and exhibiting a fill factor of 31%. The capacitance of SiPMs was measured as a function of reverse bias voltage at frequencies ranging from from 20 Hz up to 1 MHz and temperatures from 300 K down to 85 K. While leakage currents were measured at temperatures from 400 K down to 85 K. Thus, the threshold voltage - i.e., voltage corresponding to that at which the multiplication regime for the leakage current begins - could be determined as a function of temperature. Finally, an electrical model suited to reproduce the dependence of the frequency dependence of capacitance is presented.

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