二氧化硅辅助生长DNA晶体的覆盖度控制
Coverage Control of Silica-Assisted Grown DNA Crystals
摘要：
DNA纳米技术的主要目标之一是提供一个可行的解决方案，以自上而下的方法在微细加工方案的局限性。虽然完全实用的自下而上的方法尚未实现，但过去几年来，在整合这两种方法方面取得了很大进展。在这种情况下，我们提出了一种新的表面辅助制造方案，能够直接控制覆盖率，从0到100%，功能化的DNA纳米结构的厘米级二氧化硅（SiO_2）基板上，这是一个关键，利用DNA的独特性质在电子学和光子学。此外，DNA结构和表面之间的静电相互作用导致结构的急剧拓扑变化，从而形成新的晶体。这些结果为DNA纳米结构的功能化层在SiO_2基电子学和光子学中的应用提供了一条直接的途径。
英文摘要：
One of the main goals of DNA nanotechnology is to provide a viable solution to the limitations of top-down approaches in microfabrication schemes. Although a completely practical bottom-up approach is yet to be realized, there has been great progress in integrating the two approaches in the past few years. In this vein, we present a novel surface assisted fabrication scheme able to directly control the coverage rate, from 0 to 100%, of functionalized DNA nanostructures on centimeter-scaled silica (SiO_2) substrates which is one key to harnessing DNA's unique properties in electronics and photonics. Furthermore, electrostatic interactions between the DNA structures and the surface lead to dramatic topological changes of the structures, creating novel formations of the crystals. These results provide a direct route to applying fully functionalized layers of DNA nanostructures to current technologies in SiO_2-based electronics and photonics.
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