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arXiv 1107.4398cond-mat.str-el
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有效屏蔽与石墨烯中的等离子体子带

Effective screening and the plasmaron bands in Graphene

Andrew L. Walter, Aaron Bostwick, Ki-Joon Jeon, Florian Speck, Markus Ostler, Thomas Seyller, Luca Moreschini, Young Jun Chang, Marco Polini, Reza Asgari, Allan… 展开作者

Andrew L. Walter, Aaron Bostwick, Ki-Joon Jeon, Florian Speck, Markus Ostler, Thomas Seyller, Luca Moreschini, Young Jun Chang, Marco Polini, Reza Asgari, Allan H. MacDonald, Karsten Horn, Eli Rotenberg

摘要:

石墨烯中的电子-等离子体激元耦合最近已被证明会引起“等离子体激元”准粒子激发。已经预测这种耦合的强度取决于有效的屏蔽,而有效的屏蔽又取决于石墨烯片的介电环境。在这里,我们通过使用角分辨光电发射光谱评估等离子体带与空穴带的分离来比较四种不同衬底上石墨烯的环境筛选强度。与G 0 W-RPA预测的比较用于确定下面的衬底层的有效介电常数。我们还表明,等离子体和石墨烯的电子性质可以独立操纵,一个重要的方面,可能用于“等离子体”设备。

英文摘要:

Electron-plasmon coupling in graphene has recently been shown to give rise to a "plasmaron" quasiparticle excitation. The strength of this coupling has been predicted to depend on the effective screening, which in turn is expected to depend on the dielectric environment of the graphene sheet. Here we compare the strength of enviromental screening for graphene on four different substrates by evaluating the separation of the plasmaron bands from the hole bands using Angle Resolved PhotoEmission Spectroscopy. Comparison with G0W-RPA predictions are used to determine the effective dielectric constant of the underlying substrate layer. We also show that plasmaron and electronic properties of graphene can be independently manipulated, an important aspect of a possible use in "plasmaronic" devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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