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arXiv 1105.4909quant-ph
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用于量子信息处理的单片微加工对称离子阱

Monolithic Microfabricated Symmetric Ion Trap for Quantum Information Processing

Fayaz Shaikh, Arkadas Ozakin, Jason M. Amini, Harley Hayden, C. -S. Pai, Curtis Volin, Douglas R. Denison, Daniel Faircloth, Alexa W. Harter, Richart E. Slusher

摘要:

我们描述了一种新型的单片离子阱,结合了硅微制造技术的灵活性和可扩展性与传统的四杆保罗陷阱的优越的捕获特性。所提出的微加工陷阱的性能接近的宏观结构。制造过程产生了一个有角度的通过芯片的槽,允许背面离子加载和通过激光访问,同时避免表面光散射和电介质充电。阱的几何形状和尺寸被优化用于限制具有相等离子间距的长离子链[G. D. Lin等人,欧罗巴Lett. 86,60004(2009)]。控制电位已被导出,以产生线性的,等间距的离子链,最多50个离子间隔在10 μ m。由于在这种设计中可实现的深捕获深度,我们期望这些链将足够长的寿命以用于磁系统的量子模拟[E.E. Edwards等人,B82,060412(R)(2010)]。该陷阱目前正在佐治亚理工学院使用超大规模集成电路技术制造。

英文摘要:

We describe a novel monolithic ion trap that combines the flexibility and scalability of silicon microfabrication technologies with the superior trapping characteristics of traditional four-rod Paul traps. The performace of the proposed microfabricated trap approaches that of the macroscopic structures. The fabrication process creates an angled through-chip slot which allows backside ion loading and through-laser access while avoiding surface light scattering and dielectric charging. The trap geometry and dimensions are optimized for confining long ion chains with equal ion spacing [G.-D. Lin, et al., Europhys. Lett. 86, 60004 (2009)]. Control potentials have been derived to produce linear, equally spaced ion chains of up to 50 ions spaced at 10 um. With the deep trapping depths achievable in this design, we expect that these chains will be sufficiently long-lived to be used in quantum simulations of magnetic systems [E.E. Edwards, et al., Phys. Rev. B 82, 060412(R) (2010)]. The trap is currently being fabricated at Georgia Tech using VLSI techniques.

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