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arXiv 1105.2664cond-mat.mes-hall
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$Bi_2 Se_3$拓扑绝缘体的反应性化学掺杂

Reactive chemical doping of the $Bi_2 Se_3$ topological insulator

Hadj M. Benia, Chengtian Lin, Klaus Kern, Christian R. Ast

摘要:

使用角分辨光电子能谱,我们研究了拓扑绝缘体$\text{Bi}_2\text{Se}_3$的表面电子结构的演变作为水蒸气暴露的函数。我们发现,与水的表面反应引起的能带弯曲移动狄拉克点深入到占领状态,并创建量子阱态与强大的拉什巴型分裂。因此,表面不是化学惰性的,但拓扑状态仍然受到保护。带弯曲追溯到硒抽象离开带正电的空位在表面上。由于水蒸气的存在,当将$\text{Bi}_2\text{Se}_3$晶体留在真空中或在空气中裂解时发生类似的效应,这可能解释了在$\text{Bi}_2\text{Se}_3$能带结构中观察到的老化效应。

英文摘要:

Using angle resolved photoemission spectroscopy we studied the evolution of the surface electronic structure of the topological insulator $\text{Bi}_2\text{Se}_3$ as a function of water vapor exposure. We find that a surface reaction with water induces a band bending shifting the Dirac point deep into the occupied states and creating quantum well states with a strong Rashba-type splitting. The surface is thus not chemically inert, but the topological state remains protected. The band bending is traced back to Se-abstraction leaving positively charged vacancies at the surface. Due to the presence of water vapor, a similar effect takes place when $\text{Bi}_2\text{Se}_3$ crystals are left in vacuum or cleaved in air, which likely explains the aging effect observed in the $\text{Bi}_2\text{Se}_3$ band structure.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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