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arXiv 1102.5422cond-mat.mes-hall
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硅掺杂石墨烯结构中的可调谐带隙开放

Tunable Bandgap Opening in the Proposed Structure of Silicon Doped Graphene

Mohammad S. Sharif Azadeh, Alireza Kokabi, Mehdi Hosseini, Mehdi Fardmanesh

摘要:

介绍了一种特殊的硅杂质掺杂石墨烯的结构,并对其进行了分析。用密度泛函方法计算了该结构的能带结构。利用能带结构计算了基质石墨烯中不同硅位置的能带结构,研究了硅浓度和晶胞几何形状对所提出结构的能带结构的影响。根据DFT计算,化学硅掺杂的石墨烯导致大至2eV的能隙。正如我们将展示的那样,与以前的带隙工程方法相比,这种结构具有显著的优点,包括宽禁带调谐能力和对晶格几何形状的可忽略的依赖性。

英文摘要:

A specific structure of doped graphene with substituted silicon impurity is introduced and ab. initio density-functional approach is applied for energy band structure calculation of proposed structure. Using the band structure calculation for different silicon sites in the host graphene, the effect of silicon concentration and unit cell geometry on the bandgap of the proposed structure is also investigated. Chemically silicon doped graphene results in an energy gap as large as 2eV according to DFT calculations. As we will show, in contrast to previous bandgap engineering methods, such structure has significant advantages including wide gap tuning capability and its negligible dependency on lattice geometry.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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