氘离子注入某些纯金属和合金的深度浓度
Depth concentrations of deuterium ions implanted into some pure metals and alloys
摘要：
纯金属（Cu、Ti、Zr、V、Pd）和稀释的Pd合金（Pd-Ag、Pd-Pt、Pd-Ru、Pd-Rh）被25 keV氘离子以范围为（1.2 - 2.3）× 1022 D+/m2的注量注入。分别在植入后10天和3个月用弹性反冲检测分析（ERDA）和卢瑟福背散射（RBS）测量氘离子的深度分布。所获得的结果的比较允许作出结论的氘和氢气在纯金属和稀释的Pd合金的相对稳定性。观察到注入的氘离子从V和Pd纯金属和Pd合金中的非常高的扩散速率。小角X-射线散射显示，在植入钛和钛纳米级缺陷的形成。
英文摘要：
Pure metals (Cu, Ti, Zr, V, Pd) and diluted Pd-alloys (Pd-Ag, Pd-Pt, Pd-Ru, Pd-Rh) were implanted by 25 keV deuterium ions at fluences in the range (1.2÷2.3)x1022 D+/m2. The post-treatment depth distributions of deuterium ions were measured 10 days and three months after the implantation using Elastic Recoil Detection Analysis (ERDA) and Rutherford Backscattering (RBS). Comparison of the obtained results allowed to make conclusions about relative stability of deuterium and hydrogen gases in pure metals and diluted Pd alloys. Very high diffusion rates of implanted deuterium ions from V and Pd pure metals and Pd alloys were observed. Small-angle X-ray scattering revealed formation of nanosized defects in implanted corundum and titanium.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
