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arXiv 1010.2117cond-mat.mes-hall
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具有单粒子和双粒子发射体的电子流谱

Spectroscopy of electron flows with single- and two-particle emitters

Michael Moskalets, Markus Büttiker

摘要:

为了分析不同电子源的注入载流子流的状态,我们建议使用在量子点接触的相关测量,通过手征边缘状态连接到两个输入的不同的源。特别是,我们考虑的情况下,按需单电子发射器与从一个偏置的正常水库,接触受到交变电压和随机单电子发射器的载波入射。相关性可以被看作是一种光谱工具,用于比较不同来源的注入粒子的状态。如果在量子点接触处,电子的振幅分布重叠,则噪声相关被抑制。在不存在重叠的情况下,噪声大致是由于每个输入中的电子流引起的噪声功率的总和。我们表明,从(直流或交流)偏置的金属接触发射的电子状态是不同的洛伦兹振幅的电子状态发射的单电子发射器(量子电容器驱动慢谐波电位),因为与这些输入的噪声相关性不被抑制。相比之下,如果将量化的电压脉冲施加到金属触点而不是直流(交流)偏置,则可以抑制噪声。我们发现多电子脉冲的噪声抑制和随机电子发射器的情况下,在量子点接触的电子的外观是概率的。

英文摘要:

To analyze the state of injected carrier streams of different electron sources, we propose to use correlation measurements at a quantum point contact with the different sources connected via chiral edge states to the two inputs. In particular we consider the case of an on-demand single-electron emitter correlated with the carriers incident from a biased normal reservoir, a contact subject to an alternating voltage and a stochastic single electron emitter. The correlation can be viewed as a spectroscopic tool to compare the states of injected particles of different sources. If at the quantum point contact the amplitude profiles of electrons overlap, the noise correlation is suppressed. In the absence of an overlap the noise is roughly the sum of the noise powers due to the electron streams in each input. We show that the electron state emitted from a (dc or ac) biased metallic contact is different from a Lorentzian amplitude electron state emitted by the single electron emitter (a quantum capacitor driven with slow harmonic potential), since with these inputs the noise correlation is not suppressed. In contrast, if quantized voltage pulses are applied to a metallic contact instead of a dc (ac) bias then the noise can be suppressed. We find a noise suppression for multi-electron pulses and for the case of stochastic electron emitters for which the appearance of an electron at the quantum point contact is probabilistic.

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