化学腐蚀SrTiO3的深度分辨亚表面缺陷
Depth-Resolved Subsurface Defects in Chemically Etched SrTiO3
摘要：
深度分辨阴极射线发光光谱的原子级平坦的TiO 2-终止SrTiO 3单晶表面揭示了显着的差异，在原生点缺陷产生的常规蚀刻与缓冲HF（BHF）和替代程序使用盐酸-硝酸酸性溶液（HCLNO），产生三倍少的氧空位前和近一个数量级后，纯氧退火。BHF产生的缺陷密度在表面以下延伸数百nm，而较低的HCLNO处理的密度延伸小于50 nm。这种“Arkansas”HCLNO蚀刻和退火方法避免了HF处理，并为复杂氧化物异质结构生长提供了具有低原生缺陷密度的高质量SrTiO 3表面
英文摘要：
Depth-resolved cathodoluminescence spectroscopy of atomically flat TiO2-terminated SrTiO3 single crystal surfaces reveals dramatic differences in native point defects produced by conventional etching with buffered HF (BHF) and an alternative procedure using HCl-HNO3 acidic solution (HCLNO), which produces three times fewer oxygen vacancies before and nearly an order of magnitude fewer after pure oxygen annealing. BHF-produced defect densities extend hundreds of nm below the surface, whereas the lower HCLNO-treated densities extend less than 50 nm. This "Arkansas" HCLNO etch and anneal method avoids HF handling and provides high quality SrTiO3 surfaces with low native defect density for complex oxide heterostructure growth
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