在单个电子束光刻步骤中接触单个Fe（110）点
Contacting individual Fe(110) dots in a single electron-beam lithography step
摘要：
我们报告了一种新的方法，完全基于电子束光刻技术，电接触，在一个四探针计划，通过自组装获得的单个纳米结构。在我们的过程中，感兴趣的纳米结构在同一制造步骤中被定位和接触。这种技术已经被开发用于研究在细长结构如Fe（110）点中观察到的非对称布洛赫畴壁的内部分量的场致反转。我们已经集中在控制，使用外部磁场，内Néel帽，终止在两个接口的畴壁的磁化方向。初步的磁输运测量结果进行了讨论，证明单Fe（110）点已接触。
英文摘要：
We report on a new approach, entirely based on electron-beam lithography technique, to contact electrically, in a four-probe scheme, single nanostructures obtained by self-assembly. In our procedure, nanostructures of interest are localised and contacted in the same fabrication step. This technique has been developed to study the field-induced reversal of an internal component of an asymmetric Bloch domain wall observed in elongated structures such as Fe(110) dots. We have focused on the control, using an external magnetic field, of the magnetisation orientation within Néel caps that terminate the domain wall at both interfaces. Preliminary magneto-transport measurements are discussed demonstrating that single Fe(110) dots have been contacted.
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