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arXiv 0901.3135cond-mat.mtrl-sci
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Si(111)7 x7表面电荷密度的精细化

Charge Density Refinement of the Si (111) 7x7 Surface

J. Ciston, A. Subramanian, I. K. Robinson, L. D. Marks

摘要:

我们报道了利用X射线和高能电子衍射相结合的方法对Si(111)7 x7表面局域电荷密度的实验改进。通过对一个键心赝原子模型的微扰,实验发现吸附原子与其正下方的原子处于反键态。我们还能够通过实验改进0.26(4)e-从每个吸附原子位置到下面的层的电荷转移。这些结果进行了比较与全电位全电子密度泛函DFT计算。

英文摘要:

We report an experimental refinement of the local charge density at the Si (111) 7x7 surface utilizing a combination of x-ray and high energy electron diffraction. By perturbing about a bond-centered pseudoatom model, we find experimentally that the adatoms are in an anti-bonding state with the atoms directly below. We are also able to experimentally refine a charge transfer of 0.26(4) e- from each adatom site to the underlying layers. These results are compared with a full-potential all-electron density functional DFT calculation.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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