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arXiv 0812.2923cond-mat.mtrl-sci
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在$GW$近似下Si、GaAs、InAs、ZnS和GaN的碰撞电离率

Impact ionization rates for Si, GaAs, InAs, ZnS, and GaN in the $GW$ approximation

Takao Kotani, Mark van Schilfgaarde

摘要:

本文采用第一性原理方法,在$GW$近似($GW$ A)下计算了半导体的碰撞电离率(IIR)。IIR是从$GW$ A中的准粒子(QP)宽度计算的,因为它可以被识别为QP到较低能量QP的衰减速率加上独立的电子-空穴对。准粒子自洽$GW$方法被用来生成$GW$ A需要作为输入的非相互作用哈密顿量。小的经验修正,以重现实验带隙。我们的结果是在合理的协议与以前的工作,虽然我们观察到一些差异。特别是,我们发现高IIR在低能量的窄禁带半导体InAs。

英文摘要:

We present first-principles calculations of the impact ionization rate (IIR) in the $GW$ approximation ($GW$A) for semiconductors. The IIR is calculated from the quasiparticle (QP) width in the $GW$A, since it can be identified as the decay rate of a QP into lower energy QP plus an independent electron-hole pair. The quasiparticle self-consistent $GW$ method was used to generate the noninteracting hamiltonian the $GW$A requires as input. Small empirical corrections were added so as to reproduce experimental band gaps. Our results are in reasonable agreement with previous work, though we observe some discrepancy. In particular we find high IIR at low energy in the narrow gap semiconductor InAs.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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