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arXiv 0803.4038cond-mat.mes-hallcond-mat.mtrl-sci
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Nonvolatile memory with molecule-engineered tunneling barriers

Tuo-Hung Hou, Hassan Raza, Kamran Afshari, Daniel J. Ruebusch, Edwin C. Kan

英文摘要:

We report a novel field-sensitive tunneling barrier by embedding C60 in SiO2 for nonvolatile memory applications. C60 is a better choice than ultra-small nanocrystals due to its monodispersion. Moreover, C60 provides accessible energy levels to prompt resonant tunneling through SiO2 at high fields. However, this process is quenched at low fields due to HOMO-LUMO gap and large charging energy of C60. Furthermore, we demonstrate an improvement of more than an order of magnitude in retention to program/erase time ratio for a metal nanocrystal memory. This shows promise of engineering tunnel dielectrics by integrating molecules in the future hybrid molecular-silicon electronics.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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