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arXiv 0802.4073cond-mat.mes-hallcond-mat.dis-nn

Measurement of Coulomb drag between Anderson insulators

K. Elsayad, J. P. Carini, D. V. Baxter

英文摘要:

We report observations of the Coulomb drag effect between two effectively 2-d insulating a-Si_{1-x}Nb_{x} films. We find that there only exist a limited range of experimental parameters over which we can measure a sizable linear-response transresistivity (ρ_{d}). The temperature dependence of ρ_{d} is consistent with the layers being Efros-Shklovskii Anderson insulators provided that a 3-d density of states and a localization length smaller than that obtained from the DC layer-conductivity are assumed.

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