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arXiv 0710.4595cond-mat.mes-hall
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声子散射对p-i-n带间隧穿晶体管性能的影响

Influence of Phonon Scattering on the Performance of p-i-n Band-to-Band-Tunneling Transistors

Siyuranga O. Koswatta, Mark S. Lundstrom, Dmitri E. Nikonov

摘要:

功耗已经成为现代集成电路性能扩展的主要障碍,并且已经刺激了对在较低电压摆幅下操作的器件的研究。本文研究了以半导体碳纳米管为沟道材料的p-i-n带间隧穿场效应晶体管(TFET)。这些器件的导通电流主要受到隧穿势垒特性的限制,声子散射仅具有适度的影响。然而,我们发现,截止电流是有限的声子吸收辅助隧穿,因此是强烈的温度依赖性。即使在室温下,也可以很容易地实现低于60 mV/十倍传统限制的亚阈值摆幅。有趣的是,虽然亚阈值摆幅下降,由于声子散射的影响,它仍然在实际偏置条件下低。

英文摘要:

Power dissipation has become a major obstacle in performance scaling of modern integrated circuits, and has spurred the search for devices operating at lower voltage swing. In this letter, we study p-i-n band-to-band tunneling field effect transistors (TFET) taking semiconducting carbon nanotubes as the channel material. The on-current of these devices is mainly limited by the tunneling barrier properties, and phonon scattering has only a moderate effect. We show, however, that the off-current is limited by phonon absorption assisted tunneling, and thus is strongly temperature-dependent. Subthreshold swings below the 60mV/decade conventional limit can be readily achieved even at room temperature. Interestingly, although subthreshold swing degrades due to the effects of phonon scattering, it remains low under practical biasing conditions.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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