纳尔逊对双缝实验解释的一个脚注
A footnote to Nelson's interpretation of the two-slit experiment
摘要：
我们试图补充纳尔逊的工作在双缝实验表明，双缝过程，其密度表现出的特征干涉图案，可以得到作为模型后，光束已达到屏幕上的一个变分机制。单缝工艺在光束到达屏幕之前对其进行建模，起到参考模型的作用。
英文摘要：
We seek to complement Nelson's work on the two-slit experiment by showing that the two-slit process, whose density exhibits the characteristic interference pattern, may be obtained as the model after the beam has reached the screen by means of a variational mechanism. The one-slit process, modeling the beam before it reaches the screen, plays the role of a reference model.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
