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arXiv physics/0501109physics.atom-phcond-mat.mtrl-sci
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利用面内磁化永磁薄膜制作Ioffe-Pritchard微陷阱

Creating Ioffe-Pritchard micro-traps from permanent magnetic film with in-plane magnetization

I. Barb, R. Gerritsma, Y. T. Xing, J. B. Goedkoop, R. J. C. Spreeuw

摘要:

我们提出了使用平面图案的硬磁材料的Ioffe-Pritchard型磁阱的设计。通过对40 $μ$ μ m厚的FePt箔进行电火花腐蚀,产生具有不同图案设计的两个样品。第一个样品上的图案分别产生51 Hz和6.8 kHz的计算轴向和径向陷阱频率。对于第二个样本,计算的频率为34 Hz和11 kHz。该结构被成功地用作$^{87}$ Rb的磁光阱,并作为磁阱加载。第三种设计,基于光刻图案化的250 nm厚的FePt膜上的Si衬底,产生19个陷阱的阵列,计算的轴向和径向陷阱频率分别为1.5 kHz和110 kHz。

英文摘要:

We present designs for Ioffe-Pritchard type magnetic traps using planar patterns of hard magnetic material. Two samples with different pattern designs were produced by spark erosion of 40 $μ$m thick FePt foil. The pattern on the first sample yields calculated axial and radial trap frequencies of 51 Hz and 6.8 kHz, respectively. For the second sample the calculated frequencies are 34 Hz and 11 kHz. The structures were used successfully as a magneto-optical trap for $^{87}$Rb and loaded as a magnetic trap. A third design, based on lithographically patterned 250 nm thick FePt film on a Si substrate, yields an array of 19 traps with calculated axial and radial trap frequencies of 1.5 kHz and 110 kHz, respectively.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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