强laser场辐照下薄膜的朗道阻尼
Landau damping in thin films irradiated by a strong laser field
摘要：
本文计算了束缚在加热电离薄膜中的经典电子气的线性无碰撞阻尼率。得到了介电张量虚部随单粒子自洽电子势参数变化的一般表达式。对于深矩形井的情况下，它被明确地计算为电子温度的函数在两个极限情况下的镜面反射和漫反射的电子从边界的自洽电位。对于现实的实验参数，朗道阻尼的电子子系统的加热的贡献估计。它示出，对于膜的厚度低于约100 nm和中等的激光强度，它可以与电子-离子碰撞和内电离，甚至占主导地位。
英文摘要：
The rate of linear collisionless damping (Landau damping) in a classical electron gas confined to a heated ionized thin film is calculated. The general expression for the imaginary part of the dielectric tensor in terms of the parameters of the single-particle self-consistent electron potential is obtained. For the case of a deep rectangular well, it is explicitly calculated as a function of the electron temperature in the two limiting cases of specular and diffuse reflection of the electrons from the boundary of the self-consistent potential. For realistic experimental parameters, the contribution of Landau damping to the heating of the electron subsystem is estimated. It is shown that for films with a thickness below about 100 nm and for moderate laser intensities it may be comparable with or even dominate over electron-ion collisions and inner ionization.
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