发表机构
Prince Mohammad Bin Fahd University; Boston University（穆罕默德·本法赫德国王大学; 波士顿大学）
机构由 AI 辅助整理，请以论文原文为准。AI 中文总结
本研究针对非平衡Casimir排斥力设计提出鲁棒约束优化方法，在不确定条件下最大化向外压力，并证明对称优化器存在，为腔增强效应提供设计界限。
AI 中文摘要
非平衡电磁涨落为实现Casimir-Lifshitz排斥力提供了一条途径。然而，仅在标称条件下优化的设计可能是不稳健的。我们将平面PEC-真空-偏置GaAs-真空-PEC堆栈中的排斥力表述为一个鲁棒约束优化问题。在两个导体上，较小的向外压力在制造和驱动不确定性下被最大化。在光学厚板极限下，我们证明了相同的边界允许对称优化器，因此最优间隙的相等性是从模型中推导出来的，而不是被强加的。在300 K温度下，间隙不确定性为±10 nm，驱动不确定性为±0.005，优化设计在最坏情况下维持了2.257 mPa的向外压力，并超过相应的远场辐射压力平台0.1812 mPa。在标称和主动最坏情况下，完整的有限板散射计算与简化模型的一致性在1.60×10⁻³%以内。这些结果为腔增强的非平衡Casimir-Lifshitz排斥力提供了设计界限，并展示了鲁棒优化如何区分腔增强与普通远场辐射压力。
英文摘要
Nonequilibrium electromagnetic fluctuations offer a route to repulsive Casimir--Lifshitz forces. However, designs optimized only at nominal conditions may be fragile. We formulate repulsion in a planar PEC--vacuum--biased-GaAs--vacuum--PEC stack as a robust constrained optimization problem. The smaller of the outward pressures on the two conductors is maximized under fabrication and drive uncertainties. In the optically thick-slab limit, we prove that identical boundaries admit a symmetric optimizer, so equality of the optimal gaps emerges from the model rather than being imposed. At $300~\mathrm{K}$, with gap uncertainty of $\pm10~\mathrm{nm}$ and drive uncertainty of $\pm0.005$, the optimized design sustains a worst-case outward pressure of $2.257~\mathrm{mPa}$ and exceeds the corresponding far-field radiation-pressure plateau by $0.1812~\mathrm{mPa}$. At the nominal and active worst-case points, a full finite-slab scattering calculation agrees with the reduced model to within $1.60\times10^{-3}\%$. These results provide a design bound for cavity-enhanced nonequilibrium Casimir--Lifshitz repulsion and show how robust optimization can distinguish cavity enhancement from ordinary far-field radiation pressure.
Comments30 pages, 7 figures
