发表机构
National Key Laboratory of Science and Technology on Vacuum Electronics, School of Electronic Science and Engineering, University of Electronic Science and Technology of China; Department of Applied Physics, Xian University of Technology, Xian 710048, China（电子科技大学电子科学与工程学院真空电子学科学与技术国家重点实验室; 西安理工大学应用物理系）
机构由 AI 辅助整理，请以论文原文为准。AI 中文总结
本文提出利用特征X射线产额非破坏性测定范德华薄膜厚度，建立六阶多项式模型，经蒙特卡洛模拟和实验验证，可预测产额并推断厚度。
AI 中文摘要
特征X射线的产生对于制造X射线源和研究光与物质相互作用至关重要。在此，我们证明特征X射线的产生也可用于以非破坏性方式测定范德华薄膜的厚度。具体而言，我们建立了一个六阶多项式模型，将薄膜厚度与特征X射线产额相关联。该模型既能预测任意厚度石墨薄膜的X射线产额，也能根据相应的特征X射线产额推断薄膜厚度。我们通过将模型对石墨薄膜的预测X射线产额与蒙特卡洛模拟结果进行比较来验证该模型。此外，我们通过实验验证了所提出的利用X射线光子产额表征提取石墨薄膜厚度的方法的可靠性和可行性。我们的研究结果为测定范德华薄膜厚度提供了一种非破坏性方法。
英文摘要
Characteristic X ray generation is essential for producing X ray sources and for investigating light matter interactions. Here, we demonstrate that characteristic X ray generation can also be employed to determine the thickness of van der Waals thin films in a non destructive manner. Specifically, we establish a sixth order polynomial model that relates film thickness to the characteristic X ray yield. The model can both predict the X ray yield of graphite films at arbitrary thicknesses and infer the film thickness from a corresponding characteristic X ray yield. We validate the model by comparing its predicted X ray yields for graphite films with those obtained from Monte Carlo simulations. Additionally, we experimentally validated the reliability and feasibility of the proposed method for extracting graphite film thickness via X ray photon yield characterization. Our results provide a non destructive approach for determining the thickness of van der Waals thin films.
Comments16 pages, 4 figures
