斜入射平行狭缝SPP场中的表面法向电自旋
Surface-Normal Electric Spin in Obliquely Excited Parallel-Slit SPP Fields
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中文总结 AI 辅助
本文研究斜入射下平行狭缝SPP场的表面法向电自旋，发现通过入射角可调谐自旋纹理周期，且基底侧与空气侧激发产生不同自旋分布，干涉模型可重现结果。
中文摘要 AI 辅助
手性依赖的光与物质相互作用需要控制局部电场旋转，但在斜入射条件下生成受控的表面法向自旋纹理是困难的。本文表明，对周期性平行狭缝阵列进行斜s偏振照射会产生空间交替的表面法向电自旋，其周期可通过入射角连续调谐。我们进一步证明，根据SPP场是否与激发场干涉，自旋纹理在基底侧和空气侧激发之间发生定性变化。在基底侧激发下，自旋分布遵循传统的自旋-流关系；而在空气侧激发下，SPP与激发场之间的干涉产生不同的空间周期性，并使自旋极值与场强最大值重合。一个简单的干涉模型重现了这些对比鲜明的自旋纹理。
英文摘要
Handedness-dependent light-matter interactions require control of local electric-field rotation, but generating controlled surface-normal spin textures is difficult under oblique illumination. Here, we show that oblique s-polarized illumination of a periodic array of parallel slits produces spatially alternating surface-normal electric spin, with its period continuously tunable by the incidence angle. We further show that the spin texture changes qualitatively between substrate- and air-side excitation depending on whether the SPP field interferes with the excitation field. Under substrate-side excitation, the spin distribution follows the conventional spin-flow relation, whereas under air-side excitation, interference between the SPP and excitation fields produces a distinct spatial periodicity and allows the spin extrema to coincide with the field-intensity maxima. A simple interference model reproduces these contrasting spin textures.
发表机构
- National Institute for Materials Science（物质材料研究机构）
- Institute of Industrial Science, The University of Tokyo（东京大学工业科学研究所）
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