发表机构
Cornell University; Lawrence Livermore National Laboratory; University of Nevada, Reno（康奈尔大学; 劳伦斯利弗莫尔国家实验室; 内华达大学里诺分校）
机构由 AI 辅助整理，请以论文原文为准。AI 中文总结
本研究通过粒子网格模拟和解析模型，探索了与双光子聚合增材制造兼容的微结构靶对非线性逆康普顿散射的控制，旨在优化γ光子束的能量、发散度和产额，实现高能低发散及高产额靶设计。
AI 中文摘要
高密度靶中的非线性逆康普顿散射（NICS）为产生高通量、宽谱的MeV级γ光子提供了一条有前景的途径，这些光子对于射线照相、光核物理和电子对产生等应用至关重要。微结构靶能够对NICS过程进行控制，以帮助塑造光子能量、角分布和总产额。本工作展示了粒子网格（PIC）模拟，探索了与双光子聚合（TPP）增材制造兼容的靶微结构，这是一种有前景的技术，能够高产量、可重复地打印小至200纳米的亚波长特征。我们研究了微结构如何影响NICS辐射，并将模拟分析与指导靶设计的简单解析模型相结合。这些结果为优化靶提供了途径，以实现低发散度、高能量光子束，在超过100 MeV时达到2.0·10^8光子/焦耳，以及在多PW范围内实现高产额靶，在1 MeV以上提供高达2.0·10^11光子/焦耳。
英文摘要
Nonlinear inverse Compton scattering (NICS) in high-density targets offers a promising route for generating high flux, broadband sources of MeV $γ$-photons which are important for applications like radiography, photonuclear physics, and pair production. Microstructured targets enable control over the NICS process to help shape the photon energy, angular distribution, and total yield. This work presents particle-in-cell (PIC) simulations exploring target microstructures compatible with two-photon polymerization (TPP) additive manufacturing, which is a promising technique that allows high-volume and reproducible printing of sub-wavelength features as small as 200 nm. We investigate how microstructures influence NICS radiation and merge simulation analysis with simple analytical models that guide target design. These results establish pathways to optimize targets for low-divergence, high-energy photon beams with 2.0$\cdot$10$^{8}$ photons/J exceeding 100 MeV and targets for high yields delivering upwards of 2.0$\cdot$10$^{11}$ photons/J above 1 MeV in the multi-PW regime.
Comments7 pages, 6 figures
