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优化下的对象到源映射:控制流踪迹能展示什么,以及源级覆盖在何处失效

Object-to-Source Mapping under Optimization: What a Control-Flow Trace Can Show, and Where Source-Level Coverage Breaks

Alexander Weiss, Albert Schulz

arXiv 2609.29656首次发表:更新:

发表机构

Accemic Technologies GmbH(Accemic科技有限公司)

机构由 AI 辅助整理,请以论文原文为准。

AI 中文总结

本文界定控制流踪迹在优化下对源级覆盖的边界,提出区分踪迹完整性、源归属与覆盖满足,并介绍一种编译前补充机制,使优化构建中条件可逐实例观测,实现MC/DC覆盖。

AI 中文摘要

在验证有效的区间内,控制流踪迹可以重建机器级执行,但源级结构覆盖额外要求从生成的指令和分支结果到源义务的验证性归属。本文定义了该边界,并用精确的编译器输出加以说明。优化可能将多个源条件融合为一个分支,用条件选择或移动替换分支,并降低调试和映射信息中的来源可追溯性。在这些情况下,踪迹对于生成的二进制可能是完整的,而条件级源证据仍未解决。因此,我们区分踪迹完整性、源归属和覆盖满足;区分源到对象变换与对象区域归属状态;并解释何时内部重新汇聚使聚合分支观测不足,而需要有序的逐实例条件评估历史。我们比较了测量较少优化的构建、约束代码生成以及添加写入状态的插桩。最后,我们描述了WO 2026/162831 A1中披露的编译前补充机制,该机制在不写入应用驻留覆盖状态的情况下,将选定的源区分保留为踪迹可观测的控制流。附录在真实硅片上端到端演示了该机制的工作示例:补充的-O3构建使每个条件单独可踪迹观测,从捕获的ETM踪迹重建逐实例历史和MC/DC判定,并测量代码大小和周期成本。其使用仍受构建特定保留、最终镜像映射、踪迹有效性和探针效应验证的约束。

英文摘要

Within a validated interval, control-flow trace can reconstruct machine-level execution, but source-level structural coverage additionally requires a validated attribution from generated instructions and branch outcomes to source obligations. This paper defines that boundary and illustrates it with exact compiler output. Optimization can fuse multiple source conditions into one branch, replace a branch with a conditional select or move, and degrade provenance in debug and mapping information. In such cases, trace may be complete for the generated binary while condition-level source evidence remains unresolved. We therefore separate trace completeness, source attribution, and coverage satisfaction; distinguish source-to-object transformations from object-region attribution states; and explain when internal reconvergence makes aggregate branch observations insufficient and ordered per-instance condition-evaluation histories necessary. We compare measuring a less-optimized build, constraining code generation, and adding state-writing instrumentation. Finally, we describe a pre-compilation supplementation mechanism disclosed in WO 2026/162831 A1 that preserves selected source distinctions as trace-observable control flow without writes to application-resident coverage state. An appendix demonstrates the mechanism end-to-end on real silicon for the worked example: the supplemented -O3 build keeps each condition individually trace-observable, per-instance histories and an MC/DC verdict are reconstructed from a captured ETM trace, and code-size and cycle costs are measured. Its use remains subject to build-specific preservation, final-image mapping, trace-validity, and probe-effect verification.

论文原文

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