发表机构
Fudan University; National Tsing Hua University; National Center for Instrumentation Research, National Institutes of Applied Research; Institute for Infocomm Research, A*STAR; The University of Sydney（复旦大学; 国立清华大学; 国家应用研究院国家仪器研究中心; 新加坡科技研究局资讯通信研究院; 悉尼大学）
机构由 AI 辅助整理，请以论文原文为准。AI 中文总结
本文提出叠层衍射监督的局部推理框架，将4D-STEM转换为实时原子尺度相位成像，无需探针校准，速度提升约千倍，并跨材料、离焦和仪器泛化。
AI 中文摘要
原子尺度相位成像对于解析决定纳米材料行为的缺陷、界面和弱散射原子至关重要。电子叠层衍射成像（electron ptychography）具有亚埃级相位灵敏度，但由于其迭代重建计算成本高且对实验校准敏感，仍是一种离线技术，无法在数据采集过程中实时使用。本文提出了一种叠层衍射监督的局部推理框架，将四维扫描透射电子显微镜（4D-STEM）转换为与采集兼容的相位成像工作流程。从单个实验AuPd数据集中重建的物理约束参考相位图作为教师标签，用于训练一个紧凑模型，该模型直接从衍射测量中预测局部相位块，无需显式探针输入或在线迭代优化。全视场图像通过确定性重叠拼接组装。该工作流程实现了每个探针位置约0.27毫秒的在线延迟和每秒约20,000个位置的吞吐量，相比GPU加速的ePIE方法提速约1000倍，同时保持原子尺度晶格衬度和倒空间保真度。无需微调，同一模型可跨材料（WS2）、离焦条件（高熵合金纳米颗粒）和仪器（300 kV下的hBN）迁移。该方法将叠层衍射冗余摊销为快速、可泛化的工作流程，实现了材料显微镜的实时原子尺度相位成像。
英文摘要
Atomic-scale phase imaging is central to resolving defects, interfaces, and weakly scattering atoms that govern the behavior of nanoscale materials. Electron ptychography delivers sub-ångström phase sensitivity but remains an offline technique, because its iterative reconstruction is computationally expensive and sensitive to experimental calibration, preventing live use during data acquisition. Here, a ptychography-supervised local inference framework is presented that converts four-dimensional scanning transmission electron microscopy (4D-STEM) into an acquisition-compatible phase-imaging workflow. Physics-constrained reference phase maps reconstructed from a single experimental AuPd dataset serve as teacher labels for a compact model that predicts local phase patches directly from diffraction measurements, without explicit probe input or online iterative optimization. Full-field images are assembled by deterministic overlap stitching. The workflow reaches an online latency of about 0.27 ms per probe position and a throughput of about 20,000 positions per second, an approximately 1,000-fold speed-up over GPU-accelerated ePIE, while preserving atomic-scale lattice contrast and reciprocal-space fidelity. Without fine-tuning, the same model transfers across materials (WS2), defocus conditions (high-entropy alloy nanoparticles), and instruments (hBN at 300 kV). The approach amortizes ptychographic redundancy into a fast, generalizable workflow that enables real-time atomic-scale phase imaging for materials microscopy.
CommentsSubmitted to Advanced Science on June 18, 2026
