激光烧蚀制备的具有择优取向和平坦界面的氧化物上金电极
Laser-Ablated Au Electrodes with Preferred Orientation and Flat Interface on Oxides
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中文总结 AI 辅助
本文发现脉冲激光沉积可在氧化物上制备具有[111]择优取向和原子级平坦界面的金电极，增强附着力，实现单一平台集成高质量电极与氧化物薄膜。
中文摘要 AI 辅助
与热蒸发金膜相比，通过脉冲激光沉积（PLD）在氧化物上沉积的金（Au）薄膜电极展现出独特的结构特性。热蒸发金形成具有随机取向晶粒的多晶薄膜，而PLD生长的金膜则表现出垂直于衬底表面的强烈[111]择优取向，这可能是由于激光烧蚀金羽流的能量特性所致。高分辨透射电子显微镜揭示了PLD生长的金电极与外延氧化物薄膜之间原子级平坦的界面，两者之间由纳米级间隙隔开，该间隙与范德华材料中的层间距相当。高度有序的微观结构和平坦的界面形貌使得金膜与氧化物表面的附着力增强。这些结果表明，PLD可以在单一沉积平台内同时制备高质量的金电极和氧化物薄膜，提供改进的界面控制，并为广泛的氧化物电子和功能器件带来潜在益处。
英文摘要
Gold (Au) thin-film electrodes deposited on oxides by pulsed laser deposition (PLD) exhibit distinctive structural properties compared with thermally evaporated Au films. While thermally evaporated Au forms polycrystalline films with randomly oriented grains, PLD-grown Au films show a strong preferred [111] orientation perpendicular to the substrate surface, likely due to the energetic nature of the laser-ablated Au plume. High-resolution transmission electron microscopy reveals atomically flat interfaces between the PLD-grown Au electrodes and epitaxial oxide thin films, separated by nanometer-scale gaps comparable to interlayer spacings in van der Waals materials. The highly ordered microstructure and flat interfacial morphology result in enhanced adhesion of the Au films to oxide surfaces. These results demonstrate that PLD can produce both high-quality Au electrodes and oxide thin films within a single deposition platform, offering improved interfacial control and potential benefits for a wide range of oxide electronic and functional devices.
发表机构
- University of Kentucky（肯塔基大学）
- The Ohio State University（俄亥俄州立大学）
机构由 AI 辅助整理，请以论文原文为准。
