发表机构
Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente; ASML Netherlands BV（特温特大学 MESA+ 纳米技术研究所 XUV 光学工业焦点小组; ASML荷兰有限公司）
机构由 AI 辅助整理，请以论文原文为准。AI 中文总结
本文首次提出基于薄膜压电致动器的主动基板支撑概念，通过原理验证器件实现超9纳米位移，可校正光刻聚焦误差，有望推动更小芯片尺寸与更高良率。
AI 中文摘要
先进的光刻扫描仪需要基板平整度达到纳米级别，以防止聚焦误差。使用静态基板支撑难以达到并维持这样的平整度。考虑到所需数千根支柱，使用体压电或线性致动器的主动校正概念因布线和体积限制而变得不可行。在这项工作中，我们展示了据我们所知首次基于薄膜压电致动器的主动基板支撑概念的演示。详细介绍了工作原理、制造步骤以及一个原理验证器件的表征，并辅以有限元建模（FEM）支持。所制造的器件显示出超过9纳米的位移，这足以校正光刻系统中的一些聚焦误差。我们预见这一新概念可能为更小的芯片尺寸和提高良率开辟道路。
英文摘要
Advanced lithography scanners require extreme substrate flatness in the range of nanometers to prevent focus errors. Such a flatness is challenging to reach and maintain using static substrate supports. Active correction concepts using bulk piezoelectric or linear actuators become prohibitive due to wiring and volume limitations, considering the thousands of pillars required. In this work, we present to our knowledge the first ever demonstration of an active substrate support concept based on thin-film piezoelectric actuators. The working principle, fabrication steps, and characterization of a proof-of-principle device, supported by finite element modeling (FEM), are presented in detail. The fabricated device shows a displacement above 9 nm, which is sufficient to correct some of the focus errors in lithography systems. We foresee that this new concept may open the way towards smaller chip dimensions and improved yield.
Comments3 pages, 3 figures, 9 references, letter
