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调试AIP的超快激光刻写设施:定义I型波导制造的参数空间

Commissioning the AIP's ultrafast laser Inscription facility: defining the parameter space for type-I waveguide fabrication

Rima Islam, Aline N. Dinkelaker, Abani Shankar Nayak, Kalaga Madhav, Martin Roth

arXiv 2609.16419首次发表:更新:

发表机构

Leibniz Institute for Astrophysics Potsdam (AIP); Friedrich-Schiller-Universität Jena(波茨坦阿佩尔天体物理研究所; 耶拿弗里德里希·席勒大学)

机构由 AI 辅助整理,请以论文原文为准。

AI 中文总结

本文通过系统探索飞秒激光刻写参数空间,优化了I型波导制造工艺,实现了J波段单模高吞吐量波导,并匹配SMF28光纤以降低插入损耗,为天体光子学器件提供关键制造基础。

AI 中文摘要

天体光子学为传统天文仪器中的体光学提供了一种紧凑、稳定的替代方案,其应用范围从高精度光谱学到高对比度干涉测量。然而,对吞吐量、精度、准确度和稳定性的严格要求需要定制化的制造工艺,这超出了标准电信技术的范畴。本工作介绍了用于确定使用飞秒激光刻写装置在石英玻璃中制造无源波导的最佳激光写入条件的迭代实验和统计方法。我们通过改变脉冲能量、重复频率、平移速度和扫描次数来系统地探索参数空间,以确定I型波导的最佳条件,其特征是纤芯中具有正折射率改性。我们报告了这些参数的优化过程,以制造在J波段(1300-1400 nm)工作的单模、高吞吐量波导。该优化的一个关键焦点是将模场直径(MFD)与SMF28光纤匹配,并最小化插入损耗。这一发展对于天体光子学器件至关重要,例如光子重整器、光束组合器和瞳孔重映射器,以及使用传统光刻方法制造的光子组件的制造后相位误差校正。其中一些组件将用于未来在Calar Alto天文台和CHARA阵列的on-sky验证。

英文摘要

Astrophotonics offers a compact, stable alternative to bulk optics in traditional astronomical instrumentation, spanning high-precision spectroscopy to high-contrast interferometry. However, the strict requirements for throughput, accuracy, precision, and stability require tailored manufacturing processes that go beyond standard telecommunications technology. This work presents the iterative experimental and statistical methods used to determine the optimal laser-writing conditions for passive waveguides in silica glass using a femtosecond laser inscription setup. We systematically explored the parameter space by varying pulse energy, repetition rate, translation speed, and scan numbers to identify the optimal conditions for Type-1 waveguides, characterized by a positive refractive-index modification in their cores. We report on the refinement of these parameters to manufacture single-mode, high-throughput waveguides that operate in the astronomical J-band (1300-1400 nm). A key focus of this optimization is to match the mode field diameter (MFD) to the SMF28 fibre and minimize insertion losses. This development is critical for astrophotonics devices, such as photonic reformatters, beam combiners, and pupil remappers, as well as post-fabrication correction of phase errors in photonic components fabricated using traditional photolithographic methods. Some of these components will be used for future on-sky validation at the Calar Alto Observatory and the CHARA array.

Comments9 pages, 8 figures. Presented at SPIE Astronomical Telescopes + Instrumentation, 2026, Copenhagen, Denmark. Proc. SPIE 14148, 141483C (2026). DOI: 10.1117/12.3104824

Journal refProc. SPIE 14148, Optical and Infrared Interferometry and Imaging X, 141483C (2026)

DOI:10.1117/12.3104824

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