具有真实弯曲轮廓的晶体摆动器产生的高强度伽马射线发射
High-Intense Gamma-Ray Emission from a Crystalline Undulator with Realistic Bending Profiles
- University of Ferrara（费拉拉大学）
- INFN, Ferrara Section（意大利国家核物理研究所费拉拉分部）
- Sapienza University of Rome（罗马第一大学）
机构由 AI 辅助整理，请以论文原文为准。
AI总结：
本研究通过数值模拟验证了基于Si(110)晶体的晶体摆动器在1.6-2.1 MeV范围产生高强度伽马射线，峰值亮度达5×10^22，优于逆康普顿源，为紧凑型MeV光源提供新方案。
AI中文摘要：
在MeV能量范围内开发紧凑且高强度的伽马射线源仍然是辐射物理学的一个重要前沿，对核物理、医学和应用科学具有深远影响。在这项工作中，我们基于周期性弯曲的Si(110)晶体，对晶体摆动器（CU）的光子发射概率和亮度进行了全面的数值研究。我们的方法整合了通过有限元方法模拟真实样品获得的真实变形轮廓，其中弯曲由图案化的Si$_3$N$_4$表面应力层诱导。使用MBN Explorer软件包进行的相对论分子动力学模拟，考虑了与预期的FACET-II设施规格一致的10 GeV正电子束。我们的结果揭示了在1.6-2.1 MeV范围内一个明显的摆动器辐射峰，与更宽的沟道辐射背景良好分离。我们表明，对于$1/2\gamma$的最佳孔径角，源达到约$5\times10^{22}$光子/秒/mm$^2$/mrad$^2$/0.1%带宽的最大峰值亮度。这一性能与大型伽马束系统高度竞争，并超过逆康普顿散射源，证实了晶体摆动器作为MeV领域高亮度、紧凑光源的潜力。
英文摘要：
The development of compact and intense $γ$-ray sources in the MeV energy range remains a significant frontier in radiation physics, with profound implications for nuclear physics, medicine and applied science. In this work, we present a comprehensive numerical investigation of the photon emission probability and brilliance of a Crystalline Undulator (CU) based on a periodically bent Si(110) crystal. Our approach integrates realistic deformation profiles obtained via Finite Element Method simulations of a realistic sample, where bending is induced by patterned Si$_3$N$_4$ surface stressors. Relativistic molecular dynamics simulations, performed using the MBN Explorer software package, consider a 10 GeV positron beam consistent with the foreseen FACET-II facility specifications. Our results reveal a distinct undulator radiation peak in the 1.6-2.1 MeV range, well-separated from the broader channeling radiation background. We show that for an optimal aperture angle of $1/2γ$, the source reaches a maximum peak brilliance of about $5\times10^{22}$~photons/s/mm$^2$/mrad$^2$/0.1\%~BW. This performance is highly competitive with large-scale Gamma-Beam Systems and exceeds that of Inverse-Compton Scattering sources, confirming the potential of crystalline undulators as high-brilliance, compact light sources for the MeV domain.
