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高性能原子层沉积制备的p型SnOx晶体管及其CFET集成

High-Performance Scaled P-Type SnOx Transistor by Atomic Layer Deposition with CFET Integration

Ziheng Wang, Wen He, Chen Gu, Kai Jiang, Liankai Zheng, Jinxiu Zhao, Zhiyu Lin, Xiangjun Liu, Di Geng, Ling Li, Mengwei Si

arXiv 2609.11114首次发表:更新:

发表机构

Institute of Micro/Nano Electromechanical System and Integrated Circuit, College of Mechanical Engineering, Donghua University; School of Information Science and Electronic Engineering, Shanghai Jiao Tong University; State Key Laboratory of Fabrication Technologies for Integrated Circuits, IMECAS(东华大学机械工程学院微纳机电系统与集成电路研究所; 上海交通大学信息科学与工程学院; 中国科学院微电子研究所集成制造技术重点实验室)

机构由 AI 辅助整理,请以论文原文为准。

AI 中文总结

本文通过原子层沉积制备高性能p型SnOx晶体管,实现6.9 cm²/Vs迁移率及80 nm沟道下38.7 mA/mm开态电流,并成功集成CFET,证明其作为后端p型器件的潜力。

AI 中文摘要

高性能p型氧化物半导体的开发对于实现单片三维集成的互补逻辑至关重要,然而p型氧化物半导体的性能仍远逊于n型对应物。在本工作中,我们通过原子层沉积(ALD)展示了高性能p型SnOx晶体管,作为单片三维集成的后端兼容器件。SnOx晶体管展现出6.9 cm²/Vs的高场效应迁移率、185 mV/dec的低亚阈值摆幅(SS)、1.8×10⁴的良好开关比(ION/IOFF)以及高偏压稳定性。将沟道长度缩小至80 nm时,在VDS为-1 V下实现了38.7 mA/mm的高开态电流。我们理解到,通过前驱体和反应工程抑制SnOx薄膜中的Sn⁴⁺组分是性能提升的关键。此外,我们还展示了将ALD SnOx p-FET垂直堆叠在ALD In2O3 n-FET上的互补场效应晶体管,在VDD为4 V时实现了21 V/V的最大电压增益。这些发现表明,ALD SnOx是用于规模化高性能后端p型晶体管的有前景的候选材料。

英文摘要

The development of high-performance p-type oxide semiconductors is essential for realizing complementary logic for monolithic 3D integration, yet p-type oxide semiconductors still exhibit substantially inferior performance compared with their n-type counterparts. In this work, we demonstrate high-performance p-type SnOx transistors by atomic layer deposition (ALD), as back-end-of-line compatible devices for monolithic 3D integration. The SnOx transistors exhibit high field-effect mobility of 6.9 cm2/Vs, low subthreshold swing (SS) of 185 mV/dec, decent on/off ratio (ION/IOFF) of 1.8*104 and high bias stability. By scaling the channel length down to 80 nm, a high on-current of 38.7 mA/mm at VDS of -1 V is achieved. It is understood that precursor and reaction engineering to suppress Sn4+ component in SnOx film are the key for performance enhancement. Furthermore, a complementary field-effect transistor with ALD SnOx p-FET vertically stacking on ALD In2O3 n-FET is also demonstrated, achieving maximum voltage gain of 21 V/V at VDD of 4 V. These findings suggest ALD SnOx as a promising candidate for scaled high-performance BEOL p-type transistors.

论文原文

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