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胶体液膜中淬火杂质周围界面的结构与动力学

Structure and dynamics of interface around a quenched impurity in a colloidal liquid film

Sabuj Mandal, Jaydeb Chakrabarti

arXiv 2609.06618首次发表:更新:

AI 中文总结

通过计算机模拟研究胶体液膜中淬火杂质周围界面,发现大杂质引起有限宽度润湿层及准长程取向序,该序中扩散率极低且存在动态异质性,双杂质重叠时取向序被抑制。

AI 中文摘要

迄今为止,淬火杂质周围的界面结构与动力学远未得到充分理解。本文通过计算机模拟,探讨了胶体液膜与淬火杂质之间界面的结构和动力学性质。我们调节淬火钉扎杂质的尺寸($\sigma_{imp}$),观察到杂质表面被一层流体润湿,对于足够大的杂质,这会产生一个有限宽度的界面区域。在此界面区域之外,由于流体-晶体相共存,主体流体表现出准长程取向序(QLRO)。我们发现,在QLRO相中,平均扩散率变得非常低,此时自范霍夫函数呈现指数尾部,这是系统内动态异质性的标志。当存在第二个杂质时,如果杂质颗粒周围的流体层发生重叠,取向序会受到抑制。

英文摘要

The interfacial structure and dynamics around a quenched impurity is far from understood till date. Here we explore the structural and dynamical properties of interface between colloidal fluid film and a quenched impurity by using computer simulation. We tune the size($σ_{imp}$) of a quenched pinned impurity and observe that the impurity surface is wetted by a fluid layer, giving rise to a finite-width interfacial region for sufficiently large impurities. Beyond this interfacial region, the host fluid exhibits quasi-long ranged orientational order(QLRO) due to the fluid- crystal phase coexistence. We find that the mean diffusivity becomes very low in the QLRO phase where the self van Hove function shows an exponential tail, signature of dynamic heterogeneity within the system. In the presence of second impurity the orientational order is suppressed if the fluid layers around the impurity particles overlap.

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