用于实现极端纵横比和高本征品质因数的3C-SiC纳米机械弦谐振器的全干法加工

中文摘要 AI 辅助

传统悬浮纳米机械谐振器的制造通常依赖湿化学工艺步骤和临界点干燥，这会降低样品良率并影响清洁度。本文提出一种全干法制造工艺，用于制备高应力3C-SiC纳米机械弦谐振器，完全避免湿化学刻蚀与清洗。采用负性电子束抗蚀剂作为刻蚀掩模，以及用于结构成型和释放的三步反应离子刻蚀工艺，实现了高制造良率、清洁的悬浮结构，以及8500的极端纵横比。对所得双夹持纳米弦谐振器进行完整力学表征，建立了耗散稀释型3C-SiC的基准本征品质因数Qintr=4200。

英文摘要

Conventional fabrication of suspended nanomechanical resonators typically relies on wet-chemical process steps and critical point drying, which can compromise sample yield and cleanliness. Here, we present an all-dry fabrication process for strongly stressed 3C-SiC nanomechanical string resonators that entirely avoids wet-chemical etching and cleaning. Using a negative-tone electron-beam resist as an etch mask and a three-step reactive-ion etching process for both structuring and release, we achieve high fabrication yield, clean suspended structures, and extreme aspect ratios of 8.500. We perform full mechanical characterization of the resulting doubly-clamped nanostring resonators, and establish a benchmark intrinsic quality factor for dissipation-diluted 3C-SiC of Qintr = 4.200.

发表机构

• Technical University of Munich（慕尼黑工业大学）
• Munich Center for Quantum Science and Technology (MCQST)（慕尼黑量子科学与技术中心）
• TUM Center for Quantum Engineering (ZQE)（慕尼黑工业大学量子工程中心）

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