发表机构
University of Hyogo; National Institutes for Quantum Science and Technology (QST); The University of Osaka（兵库大学; 量子科学技术研究机构; 大阪大学）
机构由 AI 辅助整理，请以论文原文为准。AI 中文总结
本研究构建基于Yb:KGW激光和Ar介质的HHG系统，观测到70.6 eV的59次谐波，利用该光源表征Mg薄膜与Si₃N₄膜透射率，揭示表面状态与XUV透射率的关系，验证其用于薄膜表征的适用性。
AI 中文摘要
高次谐波产生（HHG）可提供极紫外（XUV）区域的相干超短脉冲光源，在时间分辨光谱和材料表征领域具有潜在应用。本研究构建了一套HHG系统，采用Yb:KGW激光系统（PHAROS，Light Conversion）作为驱动源，以氩气（Ar）作为非线性介质，观测到最高光子能量达70.6 eV的高次谐波，对应59次谐波阶次。作为所开发XUV光源的应用，我们测量了镁（Mg）薄膜和氮化硅（Si₃N₄）膜的透射率；此外，通过X射线光电子能谱（XPS）表征了Mg薄膜的表面化学状态，并将结果与HHG光源测得的透射率进行对比，以探究包括表面氧化在内的表面状态与Mg薄膜XUV透射率之间的关系。这些结果证明了所开发的基于Ar的HHG光源在XUV光谱区域薄膜透射率表征中的适用性。
英文摘要
High-harmonic generation (HHG) provides a coherent ultrashort-pulse light source in the extreme- ultraviolet (XUV) region and has potential applications in time-resolved spectroscopy and materials characterization. In this study, we constructed an HHG system using a Yb:KGW laser system (PHAROS, Light Conversion) as the driving source and Ar gas as the nonlinear medium. High-order harmonics were observed up to a photon energy of 70.6 eV, corresponding to the 59th harmonic order. As an application of the developed XUV source, we measured the transmission of a Mg thin film and a Si3N4 membrane. In addition, the surface chemical state of the Mg thin film was characterized by X-ray photoelectron spectroscopy (XPS), and the results were compared with the transmission measured using the HHG source. This comparison was used to examine the relationship between the surface condition, including surface oxidation, and the XUV transmission of the Mg thin film. These results demonstrate the applicability of the developed Ar-based HHG source to the characterization of thin-film transmission in the XUV spectral region.
Comments7 pages, 5 figures, and Supplementary matrial
