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SePArate:利用弱监督从晶圆制造缺陷中分割图案

SePArate: Segmenting Patterns from Defects in Wafer Manufacturing Using Weak Supervision

Dain Kwon, Changmin Shin, Sunjong Park, Kanghyun Choi, Hyeyoon Lee, Jaewon Jang, Minseok Choi, Jinho Lee

arXiv 2608.30410首次发表:更新:

发表机构

Seoul National University; SK Hynix(首尔大学; SK海力士)

机构由 AI 辅助整理,请以论文原文为准。

AI 中文总结

针对半导体制造中缺陷分析的规模化需求,提出弱监督晶圆缺陷分割方法SePArate,经三阶段训练后在实验中表现优于基线方法。

AI 中文摘要

在半导体制造中,缺陷分析至关重要,但人工检测无法规模化;然而现有自动检测方法仍不足以用于根因分析和工艺优化。为此,我们提出SePArate,一种弱监督晶圆缺陷分割方法,仅利用图像级标注即可实现图案的像素级分割,其训练包含三个阶段:编码器预训练、迁移知识以学习空间线索、在合成混合缺陷数据上训练以实现精准分割。实验表明,SePArate的性能优于基线方法。

英文摘要

In semiconductor manufacturing, defect analysis is essential, but manual inspection cannot scale. However, existing automated inspection methods remain insufficient for root-cause analysis and process optimization. To this end, we present SePArate, a weakly supervised wafer defect segmentation method. SePArate enables pixel-level separation of patterns by leveraging only image-level annotations. It consists of a three-phase training: encoder pretraining, knowledge transfer to learn spatial cues, and training on synthetic mixed-defect data for accurate segmentation. Experiments demonstrate that SePArate outperforms the baselines.

Comments7 pages, 8 figures. Accepted at the 63rd ACM/IEEE Design Automation Conference (DAC 2026)

论文原文

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