超越傍轴近似的电磁光束的双对称构造：标量修正与矢量修正的显式分离
Dual-Symmetrized Construction of Electromagnetic Beams Beyond the Paraxial Approximation with an Explicit Separation of Scalar and Vectorial Corrections
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中文总结 AI 辅助
该研究提出了一种超越傍轴近似的电磁光束构造的双对称微扰框架，可显式分离标量与矢量修正，适用于任意傍轴包络和输入琼斯偏振，解决了矢量修正分配依赖构造的问题。
中文摘要 AI 辅助
我们开发了一种用于构造超越傍轴近似的电磁光束场的微扰框架，其中矢量修正对称分配于电场与磁场之间，并与各向同性标量修正分离。该方法基于从麦克斯韦方程出发的直接迭代推导，结合了“电场优先”与“磁场优先”的互补构造，从而消除了矢量修正依赖构造分配给电场或磁场的问题。此外，标量包络修正独立于高阶亥姆霍兹方程解的各向同性共偏振贡献获得，所得修正场适用于任意傍轴包络和输入琼斯偏振。
英文摘要
We develop a perturbative framework for constructing the fields of electromagnetic beams beyond the paraxial approximation, in which the vectorial correction is shared symmetrically between the electric and magnetic fields and separated from the isotropic scalar correction. The method is based on a direct iterative derivation from Maxwell equations and combines complementary electric-first and magnetic-first constructions, thereby removing the construction-dependent assignment of the vectorial correction to either the electric or magnetic field. In addition, the scalar envelope correction is obtained independently from the isotropic co-polar contribution to the solutions of the higher-order Helmholtz equation. The resulting corrected fields apply to an arbitrary paraxial envelope and input Jones polarization.
