AI 中文总结
该研究通过实验证实增材制造316L不锈钢溅射特性与传统材料相当，并验证了增材制造钨铼栅极用于KDC-40静电栅格离子源的可行性。
AI 中文摘要
本研究探讨了增材制造（AM）材料在栅格离子源应用中的溅射特性。第一部分以316L不锈钢为例，证明增材制造材料不会表现出不利的溅射行为，如更高的溅射产额，与传统制造材料相比并无差异。为此，将3个增材制造的316L不锈钢样品置于KDC-40静电栅格离子源的束流中，样品每侧分别承受400、600和800 eV三种不同能量的离子照射，持续时间为1小时。样品被掩模处理，以在处理区域和未处理区域之间形成清晰边界，该边界可通过轮廓仪识别；测试时样品被施加-18V偏压。随后使用布鲁克光学轮廓仪对样品进行检测，并通过开源软件Gwyddion进一步处理，以评估溅射产额。在400至800 eV的离子能量范围内，溅射产额为0.2至2原子/离子，且随离子能量增加而升高。测得的溅射产额与先前文献中分析模型的预测结果相当一致，同时存在一些可能由温度升高和氧化层附加效应导致的差异。第二部分展示了在现有KDC-40静电栅格离子源中使用增材制造钨铼栅极的可行性。
英文摘要
This work explores the sputtering of additively manufactured (AM) materials for use in gridded ion source applications. The first part of the paper uses 316L stainless steel as an example to demonstrate that additively manufactured material does not exhibit adverse sputtering behavior, such as higher sputter yield, compared with conventionally manufactured material. To this end, three additively manufactured 316L stainless steel samples were exposed to the beam of a KDC-40 electrostatic gridded ion source at three distinct energy levels of 400, 600, and 800 eV on each side of the sample for a duration of one hour. The samples were masked to create a distinct boundary between treated and untreated regions, identifiable using profilometry, and were biased to -18V for testing. Samples were then examined using a Bruker optical profilometer and further processed using the open-source software Gwyddion to evaluate the sputtering yield. The sputter yield varied in the range 0.2-2 atoms/ion for 400-800 eV ions and increased with ion energy. The measured sputtering yield was fairly consistent with predictions from analytical models developed in prior literature, while exhibiting some variations potentially due to added effects of increased temperature and oxide layers. The second part of the paper demonstrates feasibility of using an additively manufactured tungsten-rhenium grids in existing KDC-40 electrostatic gridded ion source.
