采用纳米打印PIAACMC相位掩模的亚衍射极限日冕成像
Sub-diffraction-limited coronagraphic imaging with nano-printed PIAACMC phase masks
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中文总结 AI 辅助
该研究采用纳米打印PIAACMC相位掩模，在麦哲伦望远镜的MagAO-X仪器上实现亚衍射极限日冕成像，探测到特定角距的双星伴星，验证了PIAACMC的相关观测能力。
中文摘要 AI 辅助
在其宿主恒星宜居带内成像类地系外行星，是未来地基和空间天文台的主要科学目标之一。然而，当前技术无法达到成像此类行星所需的极高对比度和小角距。相位诱导振幅切趾复合掩模日冕仪（PIAACMC）是实现该目标的一种有前景的日冕仪。PIAACMC采用一组非球面透镜对入射光瞳进行切趾且无通量损失，并使用移相焦平面掩模抑制恒星光，这些特性使其能保持高通量并实现小内工作角（IWA），具备在衍射极限下观测系外行星的能力。该掩模由莱顿大学使用Nanoscribe（一种采用双光子聚合实现亚微米高度精度的微3D打印机）内部制造。我们展示了智利拉斯坎帕纳斯天文台6.5米麦哲伦克莱望远镜的麦哲伦极端自适应光学系统（MagAO-X）仪器上PIAACMC焦平面掩模的首批科学结果，呈现了中心波长908纳米、带宽14%的宽带z'滤光片的实验室和实测对比度曲线。我们使用PIAACMC探测到角距约0.8-5λ/D（约23-144毫角秒）的双星伴星，证明了PIAACMC在亚λ/D IWA下于衍射极限及以下进行观测的能力。未来工作包括探索新型掩模设计以提升宽带光中的对比度，并开展主动焦平面波前传感与控制。
英文摘要
Imaging Earth-like exoplanets in the habitable zone of their host star is among the main science objectives of future ground-based and space-based observatories. However, the extreme contrast and small separations needed to image such planets cannot be reached with current technology. The Phase-Induced Amplitude Apodization Complex Mask Coronagraph (PIAACMC) is a promising coronagraph to reach this goal. The PIAACMC uses a set of aspheric lenses to apodize the entrance pupil without throughput losses and a phase-shifting focal plane mask for starlight suppression. These allow us to maintain high throughput and achieve a small inner-working angle (IWA), unlocking the capability to observe exoplanets at the diffraction limit. The masks are manufactured in-house at Leiden University with Nanoscribe, a micro-3D-printer that uses two-photon polymerization to achieve sub-micron precision in height. We present the first scientific results with a focal plane mask for the PIAACMC on the Magellan Adaptive Optics eXtreme (MagAO-X) instrument for the 6.5-meter Magellan Clay telescope at Las Campanas Observatory, Chile. We show laboratory and on-sky contrast curves with a broadband z' filter centered at 908 nm with a 14% bandwidth. We use the PIAACMC to detect binary companions at separations ~0.8-5 lambda/D (~23-144 mas). This demonstrates the PIAACMC's capability to observe at the diffraction limit and below, with a sub-lambda/D IWA. Future work includes exploring new mask designs to improve the contrast in broadband light and performing active focal plane wavefront sensing and control.
