制造公差对超材料微波减反射涂层性能的影响
Effects of manufacturing tolerances on the performance of metamaterial microwave anti-reflection coatings
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中文总结 AI 辅助
本研究探究制造公差对超材料微波减反射涂层性能的影响，通过对带超材料减反射涂层的塑料有限样品进行全波建模，表征ARC几何随机变异性对其性能的影响。
中文摘要 AI 辅助
超材料减反射涂层（ARC）被用于多种应用场景，包括透镜、滤波器和吸波器。通常，某一ARC的设计是在无限介质近似中完成的，该近似假设界面上的每个单元晶胞完全相同。但在实际应用中，某一ARC的几何结构通常存在一定程度的变异性，这种变异性可能源于应用本身固有的表面形状（如透镜中的情况），或是制造公差。这种变异性可能以未预料到的方式改变光学元件的性能，具体表现为产生额外散射、形成原本不存在的衍射极大值，最关键的是，会改变ARC随频率变化的透明度。在本研究中，我们对塑料有限样品进行全波建模，这些样品通过在其两个界面上均设置超材料ARC以与自由空间匹配；通过在ARC几何结构中加入一定程度的随机性，我们尝试表征给定变异性影响ARC预期性能的程度。
英文摘要
Metamaterial anti-reflection coatings (ARC) are used in a variety of applications, including: lenses, filters, and absorbers. Typically, the design of a given ARC is done within an infinite medium approximation, which presupposes that every unit cell on the interface is identical. However, in realistic applications, the geometry of a given ARC usually has some degree of variability, be it due to the shape of the surface inherent to the application, like in a lens, or manufacturing tolerances. This variation may alter the performance of the optical element in unanticipated ways, by creating additional scattering, enabling diffractive maxima that would normally be absent and, most crucially, changing the transparency of the ARC as a function of frequency. In this work we utilize full-wave modeling of finite samples of plastic which are matched with free space using a metamaterial ARC on both of their interfaces. By adding a degree of randomness to the ARC geometry we attempt to characterize the extent to which a given variation affects the expected performance of an ARC.
