基于超低损耗包层的钽基微谐振器中的纳米光子色散工程
Nanophotonic dispersion engineering in tantala-based microresonators with ultralow-loss claddings
浏览论文内容
中文总结 AI 辅助
本研究开发兼容钽基薄膜的整片晶圆低温工艺，制备出高Qi的微谐振器，实现50-500GHz高效率暗孤子微梳生成，可用于光子AI加速等领域。
中文摘要 AI 辅助
集成光子学需利用低损耗、非线性光学过程及光电集成，因此需要稳定的光学包层材料及配套制备工艺。我们将低损耗二氧化硅（SiO₂）包层与五氧化二钽（Ta₂O₅，即钽）集成光子学结合，制备出稳定、高本征品质因子（Qi）的微谐振器及光子晶体谐振器（PhCRs），用于孤子微梳生成。具体而言，我们开发了适用于整片晶圆的低温工艺，兼容两种钽基薄膜：纯钽，以及二氧化钛（TiO₂，即 titania）与钽的非晶金属氧化物混合物。将钽与 titania 结合可提升薄膜抵抗 SiO₂ 包层沉积工艺损伤的能力，使完全包层的微谐振器可实现高于 4×10⁶ 的高 Qi。该平台支持低损耗边缘耦合器、通过波导几何实现的群速度色散工程、用于控制相位匹配的纳米光子结构，以及整片晶圆器件的高尺寸容差。利用该平台，我们探索了重复频率在 50 GHz 至 500 GHz 范围内的高效率暗孤子微梳生成，其可应用于光子人工智能加速、电子信号传输及光数据通信等领域。
英文摘要
Integrated photonics optimized to leverage low loss, nonlinear-optical processes and optoelectronic integration requires robust optical cladding materials and associated fabrication process flows. We develop low-loss silicon dioxide (SiO$_2$) claddings with tantalum pentoxide (Ta$_2$O$_5$, tantala) integrated photonics to realize robust, high intrinsic quality factor ($Q_i$) microresonators and photonic-crystal resonators (PhCRs) for soliton microcomb generation. Specifically, we introduce a full-wafer, low-temperature process compatible with two tantala-based films: pure tantala and an amorphous metal-oxide mixture of titanium dioxide (TiO$_2$, titania) and tantala. Combining tantala with titania enhances the film's resistance to damage from the SiO$_2$ cladding deposition process, offering access to high $Q_i$ above $4 \times 10^6$ in fully cladded microresonators. Our platform supports low-loss edge couplers, group-velocity dispersion engineering by waveguide geometry, access to nanophotonic structures particularly to control phase-matching, and high dimensional tolerance in devices across an entire wafer. Using the platform, we explore the generation of high-efficiency, dark-soliton microcombs with repetition frequency from 50 GHz to 500 GHz, which supports applications such as photonic artificial intelligence acceleration, electronic signaling, and optical data communication.
