AI 中文总结
本研究通过射频磁控溅射法制备出4英寸晶圆级Ce:YIG薄膜，实现了硅基磁光隔离器的晶圆级集成，为相关器件应用提供了材料基础。
AI 中文摘要
硅基集成铈掺杂钇铁石榴石（Ce:YIG）薄膜是集成非互易光子器件、低温光子调制器及光计算应用的候选材料，但此前报道的硅基Ce:YIG薄膜仅达毫米级尺寸，晶圆级集成及高质量薄膜的无损表征一直难以实现。本研究通过射频磁控溅射法在硅衬底上制备出4英寸晶圆级Ce:YIG薄膜，在整个4英寸硅晶圆上测得其强法拉第效应达2318 deg/cm、低传播损耗为80 dB/cm，且厚度均匀性达3.5%；还建立了定制的晶圆级无损磁光椭偏术，用于表征晶圆上薄膜的厚度、光学常数及磁光常数，同时实现了环谐振器型磁光隔离器的晶圆级集成。本研究为硅基磁光薄膜的晶圆级异质集成与表征迈出了重要一步，为非互易光子器件阵列、磁光内存计算网络及集成磁光磁强计提供了候选材料。
英文摘要
Silicon integrated cerium doped yttrium iron garnet (Ce:YIG) thin films are promising candidates for integrated nonreciprocal photonic devices, cryogenic photonic modulators and optical computing applications. However, previously reported Ce:YIG thin film on silicon is limited to milimeter sizes. Wafer-scale integration and non-destructive characterization of high quality Ce:YIG thin films on silicon has been elusive. Here, we report growth of 4-inch wafer-scale Ce:YIG thin films on silicon substrates by radio-frequency magnetron sputtering. Strong Faraday effect of 2318 deg/cm, low propagation loss of 80 dB/cm and excellent thickness uniformity of 3.5% is demonstrated across the 4-inch silicon wafer. Furthermore, a custom designed wafer-scale, non-destructive magneto-ellipsometry was established to characterize the film thickness, optical constants and magneto-optical constants across the wafer. Wafer-scale integration of ring resonator type magneto-optical isolators are also demonstrated. Our work demonstrates a step forward toward wafer-scale heterogeneous integration and characterization of magneto-optical thin films on silicon, providing material candidates for non-reciprocal photonic device arrays, magneto-optical in-memory computing networks and integrated magneto-optic magnetometers.
