用于铁电薄膜沉积的自动磁控溅射腔室
An Automated Magnetron Sputtering Chamber for Ferroelectric Thin Film Deposition
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中文总结 AI 辅助
本文提供将手动沉积腔室升级为自动自主实验设备的模板，以磁控溅射腔室为例实现自动化，用于半自主确定Al$_{1-x-y}$Sc$_x$B$_y$N薄膜的工艺-性能关系，助力材料合成优化。
中文摘要 AI 辅助
有效利用数字数据集可加速下一代材料合成与制造工艺的优化，但现有多数定制研究基础设施（包括薄膜沉积用设备）主要为手动操作，与新型研究范式不兼容。本文提供了将现有手动沉积腔室升级为支持自动化和自主实验的模板，以专门用于合成纤锌矿型铁电体的现有磁控溅射腔室的升级为例，重点关注仪器自动化、系统与沉积控制，以及同步自动化数据采集策略，还给出了该系统用于半自主确定工艺-性能关系的示例用例，具体为最小化纤锌矿型Al$_{1-x-y}$Sc$_x$B$_y$N薄膜的矫顽场。
英文摘要
Optimization of next-generation materials synthesis and manufacturing processes can be accelerated by effective use of digital datasets. However, a majority of existing custom research infrastructure, including that for thin film deposition, is primarily manually operated and not compatible with this new research paradigm. Here, a template is provided for upgrading existing manual deposition chambers to enable automated and autonomous experimentation. As an example, the upgrade of an existing magnetron sputtering chamber dedicated to synthesis of wurtzite ferroelectrics is presented. Focus is placed on automation of instrumentation; system and deposition control; and synchronized and automated data collection strategies. An example use case of the system for semi-autonomous determination of process-property relationships is presented, specifically minimization of coercive field in wurtzite Al$_{1-x-y}$Sc$_x$B$_y$N thin films.
