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表面平衡机制控制有机半导体共沉积模型玻璃混合物的稳定性

Surface Equilibration Mechanism Controls the Stability of a Model Co-deposited Glass Mixture of Organic Semiconductors

Shinian Cheng, Yejung Lee, Junguang Yu, Lian Yu, M. D. Ediger

arXiv 2608.07320首次发表:更新:

AI 中文总结

该研究证实单组分PVD玻璃的表面平衡机制适用于有机半导体TPD与m-MTDATA的50:50共沉积玻璃,确定0.78-0.90Tg可制备超稳定二元玻璃,为高性能有机电子器件设计提供了思路。

AI 中文摘要

尽管此前研究已明确通过物理气相沉积(PVD)制备超稳定单组分有机玻璃的条件,但对于共沉积混合物的稳定性却知之甚少。本研究以质量浓度50:50的有机半导体TPD(N,N-双(3-甲基苯基)-N,N-二苯基联苯胺)和m-MTDATA(4,4,4-三[苯基(间甲苯基)氨基]三苯胺)为对象,在宽范围衬底温度(Tsub)下制备二元PVD玻璃,通过差示扫描量热法和光谱椭偏仪评估其焓值与动力学稳定性。当沉积温度Tsub为0.78-0.90Tg(Tg为常规玻璃化转变温度)时,可获得兼具优异热力学与动力学稳定性的二元有机半导体玻璃,其性能可与最稳定的单组分有机玻璃相媲美;当沉积温度为0.94Tg时,m-MTDATA/TPD玻璃的焓值等于该温度下平衡液体的预期焓值。由此表明,此前针对单组分PVD玻璃提出的表面平衡机制同样适用于这类共沉积玻璃,该研究为高性能有机电子器件的设计提供了途径。

英文摘要

While previous work has identified the conditions for preparing ultrastable single-component organic glasses by physical vapor deposition (PVD), little is known about the stability of co-deposited mixtures. Here, we prepared binary PVD glasses of organic semiconductors, TPD (N,N-Bis(3-methylphenyl)-N,N-diphenylbenzidine) and m-MTDATA (4,4,4-Tris[phenyl(m-tolyl)amino]triphenylamine), with 50:50 mass concentration over a wide range of substrate temperatures (Tsub). The enthalpy and kinetic stability are evaluated with differential scanning calorimetry and spectroscopic ellipsometry. Binary organic semiconductor glasses with exceptional thermodynamic and kinetic stability comparable to the most stable single-component organic glasses are obtained when deposited at Tsub=0.78-0.90Tg (where Tg is the conventional glass transition temperature). When deposited at 0.94Tg, the enthalpy of m-MTDATA/TPD glass equals that expected for the equilibrium liquid at that temperature. Thus, the surface equilibration mechanism previously advanced for single-component PVD glasses is also applicable for these co-deposited glasses. These results provide an avenue for designing high-performance organic electronic devices.

Comments23 pages, 5 figures, 47 references, Supporting information including 5 figures

Journal refJ. Phys. Chem. Lett. 2023, 14, 4297-4303

DOI:10.1021/acs.jpclett.3c00728

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