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arXiv 2608.04813cond-mat.mtrl-sci

用于紫外光电子学的GaN/Ga2O3纳米线异质结构的生长与表征

Growth and characterization of GaN/Ga2O3 Nanowire Heterostructures for Ultraviolet Optoelectronics

Edgars Butanovs, Eriks Dipans, Martins Zubkins, Edvards Strods, Anatolijs Sarakovskis, Juris Purans, Ashutosh Kumar, Sergiy Khartsev, Martin Berg, Anders Hallen… 展开作者

Edgars Butanovs, Eriks Dipans, Martins Zubkins, Edvards Strods, Anatolijs Sarakovskis, Juris Purans, Ashutosh Kumar, Sergiy Khartsev, Martin Berg, Anders Hallen, Qin Wang, Joseph le Pluart, Peter Ramvall

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中文总结 AI 辅助

该研究采用多种沉积技术制备GaN/β-Ga2O3平面及核/壳纳米线异质结构,经表征证实其具备整流特性与自供电紫外响应,为相关光电器件研发提供了可行路径。

中文摘要 AI 辅助

本研究制备并研究了紫外波段的GaN/β-Ga2O3异质结构,涵盖平面和纳米线两种几何结构:采用脉冲激光沉积法、以液态镓为靶材的反应磁控溅射法沉积β-Ga2O3;采用金属有机化学气相沉积法生长GaN纳米线阵列及平面型掺Mg的p型GaN层。通过X射线衍射、X射线光电子能谱、原子力显微镜、扫描电子显微镜等结构与形貌研究,证实可精确控制薄膜的均匀性与厚度。对平面型n-Ga2O3/p-GaN异质结二极管进行电学与光电表征,其表现出显著的整流特性、高正向电流,且在零外加偏压下呈现可见盲紫外光电响应,具备本征自供电工作能力。此外,开发并系统研究了GaN/β-Ga2O3核/壳纳米线异质结构,重点关注形貌控制与工艺优化,探究了沉积参数对壳层厚度、均匀性及锥度的影响,实现了β-Ga2O3在GaN纳米线M面晶面上的包覆性提升。研究结果表明,物理气相沉积技术可用于制备GaN/β-Ga2O3异质结构,为基于纳米线的紫外光电子器件研发奠定了基础。

英文摘要

Ultraviolet-range GaN/b-Ga2O3 heterostructures were fabricated and investigated in both planar and nanowire geometries using pulsed laser deposition and reactive magnetron sputtering from a liquid gallium target for b-Ga2O3 deposition, while both GaN nanowire arrays and planar p-type Mg-doped GaN layers were grown by metal-organic chemical vapor deposition. Precise control of film uniformity and thickness was achieved as confirmed by structural and morphology studies using X-ray diffraction, X-ray photoelectron spectroscopy, atomic force microscopy and scanning electron microscopy. Planar n-Ga2O3/p-GaN heterojunction diodes were electrically and photoelectronically characterized, exhibiting pronounced rectifying behavior, high forward current and a visible-blind ultraviolet photoresponse under zero external bias, demonstrating intrinsic self-powered operation. Furthermore, GaN/b-Ga2O3 core/shell nanowire heterostructures were developed and systematically studied with a focus on morphology control and process optimization. The influence of deposition parameters on shell thickness, uniformity, and tapering was investigated, enabling improved conformality of the b-Ga2O3 coating on the M-plane facets of GaN nanowires. The results highlight the viability of physical vapor deposition techniques for forming GaN/b-Ga2O3 heterostructures and establish a pathway toward nanowire-based ultraviolet optoelectronic devices.

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