AI 中文总结
本研究基于利夫希茨-施温格方程构建双磁子散射框架，结合铁石榴石薄膜实验，明确晶体学方向上的有效场扰动特征，建立晶体学、样品尺度有效场与双磁子散射的关联，为控制磁损耗提供理论支撑。
AI 中文摘要
控制磁损耗需要确定非本征线宽展宽的微观起源。我们提出了弱缺陷势下双磁子散射的利夫希茨-施温格框架，表明散射由有效场扰动与简并自旋波态的重叠决定。将该框架应用于铁石榴石薄膜YIG/GGG(111)和YIG/GGG(110)，我们确定了这些扰动沿其延伸的晶体学方向，该方法建立了晶体学、样品尺度有效场与双磁子散射之间的联系。
英文摘要
Controlling magnetic losses requires identifying the microscopic origin of extrinsic linewidth broadening. We introduce a Lippmann--Schwinger framework for two-magnon scattering from weak defect potentials, showing that scattering is set by the overlap between the perturbation of the effective field and degenerate spin-wave states. Applied to iron garnet films, YIG/GGG(111) and YIG/GGG(110), we identify crystallographic directions along which these perturbation are elongated. This approach provides a link between the crystallography, effective field on the sample scale and two-magnon scattering.
