通过无本征模线方法公式对可重构石墨烯超表面进行分析
Reconfigurable Graphene-Metasurface Analysis via an Eigenmode-Free Method-of-Lines Formulation
AI总结：
针对可重构石墨烯超表面分析难题，提出无本征模线方法公式，通过解析闭式表达式计算S参数矩阵，克服现有方法局限，经实验验证该方法在吸光度上与理论高度吻合且比有限元方法快两个数量级。
AI中文摘要：
我们提出一种无本征模（EF）线方法（MoL）公式，用于快速合成可重构石墨烯超表面（MS）。随着MS复杂度增加，全波方法分析具有挑战性。MoL是一种更快的半解析方法，沿垂直于MS层方向解析求解电磁方程，在MS平面上数值求解，大幅降低自由度。现有MoL公式中系统矩阵本征分解需数值计算，对大截面MS计算量很大。为克服此局限，我们引入EF MoL，通过解析闭式表达式计算S参数矩阵。通过分析可重构石墨烯MS吸收器展示了EF MoL的潜力。EF MoL在吸光度上与理论值高度吻合，且比有限元方法快两个数量级。
英文摘要：
We present an eigenmode-free (EF) method-of-lines (MoL) formulation for the fast synthesis of reconfigurable graphene metasurfaces (MS). As the complexity of MSs increases, analysis by full-wave methods becomes challenging. The MoL is a considerably faster semi-analytical method where the electromagnetic equations are solved analytically along the direction perpendicular to the MS layers and numerically on the MS plane, thereby substantially decreasing the degrees of freedom (DoFs). In existing MoL formulations, the eigendecomposition of the system matrix is calculated numerically, which becomes computationally demanding for MSs with larger cross-sections. To overcome this limitation, we introduce an EF MoL that calculates the S-parameter matrix by analytical closed-form expressions. We demonstrate the potential of the EF MoL by analyzing a reconfigurable graphene MS absorber. The EF MoL shows excellent agreement in the absorbance and is two orders of magnitude faster than the finite element method.
