用于集成到离子微芯片的快速响应低功耗原子炉
Fast-response low power atomic oven for integration into an ion microchip
AI总结：
本文提出一种基于MEMS工艺的微加工中性原子源，实现毫瓦级功耗下几十毫秒快速响应，并支持易氧化材料真空封盖加载，寿命超10年，适合集成到离子微芯片。
摘要：
我们提出了一种用于量子技术的新型微加工中性原子源，它可以通过成熟的MEMS制造技术轻松集成到微芯片器件上，并将其与传统的片外离子加载机制进行对比。该器件的加热灯丝尺寸小至90×90 μm²。对¹⁷¹Yb荧光响应的测试发现其响应时间在几十毫秒的低位，比先前文献中在毫瓦级功率下的速度快两个数量级，这使其非常适合低功耗器件封装。我们展示了如何在真空中对蒸发材料进行封盖，以便与Ba等易在空气中氧化的材料配合使用，从而在加载过程中避免使用烧蚀激光。我们计算得出，对于量子技术中常用的离子种类，原子炉的连续使用寿命超过10年。
英文摘要：
We present a novel microfabricated neutral atom source for quantum technologies that can be easily integrated onto microchip devices using well-established MEMS fabrication techniques, and contrast this to conventional off-chip ion loading mechanisms. The heating filament of the device is shown to be as small as 90$\times$90 $μ$m$^2$. Testing of the $^{171}$Yb fluorescence response is found to be in the low tens of milliseconds, two orders of magnitude faster compared to previous literature at a power of milliwatts making it desirable for low-power device packages. We demonstrate how the evaporation material can be capped in vacuum to work with materials such as Ba that oxidise easily in air, which can avoid the need for ablation lasers in the loading process. We calculate oven lifetimes to be over 10 years of continuous use for commonly used ion species in quantum technology.
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