高精度机电系统中位置相关柔性动力学的主动补偿
Active Compensation of Position Dependent Flexible Dynamics in High-Precision Mechatronics
AI总结：
针对高精度光刻设备中激进运动轨迹引发的位置相关柔性动力学问题，提出一种扩展刚体控制结构的主动补偿方法，并通过EUV晶圆台实验验证其有效性。
摘要：
半导体行业日益增长的需求对光刻设备的吞吐量和定位精度提出了越来越严格的要求。满足这些需求需要采用高度激进的运动轨迹，这会引入位置相关的柔性动力学，从而损害可实现的定位跟踪性能。本文介绍了一种控制方法，通过扩展传统的刚体控制结构以包含柔性动力学的主动控制，实现对位置相关柔性动力学的主动补偿。为了便于控制算法的实时实现，引入了适当的位置相关加权函数，确保所提方法的计算高效执行。通过在先进的极紫外（EUV）晶圆台上进行的实验，证明了所提出的控制设计方法的有效性。
英文摘要：
Growing demands in the semiconductor industry necessitate increasingly stringent requirements on throughput and positioning accuracy of lithographic equipment. Meeting these demands involves employing highly aggressive motion profiles, which introduce position-dependent flexible dynamics, thus compromising achievable position tracking performance. This paper introduces a control approach enabling active compensation of position-dependent flexible dynamics by extending the conventional rigid-body control structure to include active control of flexible dynamics. To facilitate real-time implementation of the control algorithm, appropriate position-dependent weighting functions are introduced, ensuring computationally efficient execution of the proposed approach. The efficacy of the proposed control design approach is demonstrated through experiments conducted on a state-of-the-art extreme ultraviolet (EUV) wafer stage.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
