低压电感耦合等离子体装置中E-H模式转变下NO生成与紫外发射强度的解耦
Decoupling NO production and UV emission intensity over the E-H mode transition in a low-pressure inductively coupled plasma device
AI总结：
该研究利用低压双电感耦合等离子体装置，结合OES、LIF和MRP诊断及碰撞-辐射模型，揭示了E-H模式转变中基态NO密度下降但NO(A)紫外发射持续增强的机制，即H模式下氮亚稳态激发增强补偿了基态NO密度降低。
摘要：
使用低压双电感耦合等离子体装置，研究氮气和氧气混合气体中的基础等离子体参数、等离子体化学以及一氧化氮第一激发态NO(A)的紫外光子发射。除气体混合物外，还改变射频功率和气压，并专门研究电感耦合等离子体的E-H模式转变。气体温度和紫外光子发射通过光学发射光谱（OES）测量，一氧化氮电子基态的绝对密度通过激光诱导荧光（LIF）测量，电子密度和电子温度通过多极共振探针（MRP）测量。建立了一个简单的NO(A)紫外发射碰撞-辐射模型，该模型以测得的基态一氧化氮密度、电子密度、电子温度和中性气体温度作为输入参数。结果揭示了基态一氧化氮绝对密度、由电子碰撞和与氮亚稳态碰撞驱动的该物种激发、氮亚稳态猝灭以及由此产生的紫外光子发射率之间的联系。研究表明，当放电保持在E模式时，基态一氧化氮密度随功率增加而增加；当足够的射频功率沉积到放电中并转变到H模式时，基态一氧化氮密度显著降低。尽管H模式下基态一氧化氮密度较低，但紫外光子发射强度随射频功率升高以及跨E-H转变而持续增加。研究表明，该效应是由H模式下氮亚稳态对NO(A)的激发增强所致，这种增强足以过度补偿基态一氧化氮密度的下降。
英文摘要：
A low-pressure double-inductively coupled plasma device is used to study the fundamental plasma parameters, plasma chemistry, and UV photon emission from the first excited state of nitric oxide, NO(A), in gas mixtures of nitrogen and oxygen. In addition to the gas mixture, rf power and gas pressure are varied, and the E-H mode transition of the inductively coupled plasma is studied specifically. The gas temperature and UV photon emission are measured by optical emission spectroscopy (OES), the absolute density of the nitric oxide electronic ground state by laser-induced fluorescence (LIF), as well as electron density and electron temperature by a multipole resonance probe (MRP). A simple collisional-radiative model for UV emission from NO(A) is developed, which takes the measured densities of ground state nitric oxide and electrons, as well as the electron temperature and neutral gas temperature, as input parameters. The results reveal the links between the absolute densities of ground state nitric oxide, the excitation of this species driven by electron impact and collisions with nitrogen metastables, quenching of the nitrogen metastables, and the resulting UV photon emission rate. The density of ground state nitric oxide is shown to increase with power, while the discharge remains in E-mode, and to decrease significantly with the transition into H-mode, when sufficient rf power is deposited in the discharge. Despite the lower densities of ground state nitric oxide in H-mode, the UV photon emission intensity increases continuously with higher rf powers and over the E-H transition. This effect is shown to be caused by increased excitation of NO(A) by nitrogen metastables in H-mode, which is sufficient to overcompensate the decrease in ground state nitric oxide density.
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